Abstract:
Minimizing the optical losses is very crucial in achieving higher efficiencies is silicon solar
cells. More than 30% of the incident light is lost via reflection in planner silicon solar cells
and this is more pronounced in short wavelength range [1]. One of the techniques that
addresses this issue is the front surface texturing. Silicon nanostructures, with feature size and
periodicity in the order of wavelength of light, exhibit excellent anti-reflection behavior for
broader wavelengths and incident angles. These nanostructures significantly reduce the
Fresnel reflection by gradual increase in the refractive index from air to substrate. The
reflectivity of these structures mainly depends on periodicity, height, duty cycle and shape of
the nanostructures [2]. In this work, the reflectivity of one-dimensional silicon gratings was
studied using Lumerical FDTD commercial software. The minimum reflectivity of the
optimized square grating and triangular grating were 13% and 10% respectively, whereas the
reflectivity of 33% and 35% for planner silicon at 900 nm and 700nm wavelength.
