The predominance of a surface plane of high work function on Ti films

dc.contributor.author	Kandasamy, K
dc.contributor.author	Surplice, N.A
dc.date.accessioned	2022-09-26T08:51:24Z
dc.date.available	2022-09-26T08:51:24Z
dc.date.issued	1981
dc.identifier.issn	00223719
dc.identifier.uri	http://repo.lib.jfn.ac.lk/ujrr/handle/123456789/8141
dc.description.abstract	The contact potential between clean Ti films and an Au reference surface have been determined by the Kelvin vibrating capacitor method. The majority of Ti films deposited on glass substrates had a high work function, which suggests that their surface was mainly (0001). Ti films on substrates of oxidised Ti had a much lower work function and probably had a surface of mainly (1011).	en_US
dc.language.iso	en	en_US
dc.publisher	Elsevier B.V.	en_US
dc.title	The predominance of a surface plane of high work function on Ti films	en_US
dc.type	Article	en_US