Abstract:
The influence of hydrogen implantation on the structural, magnetic and electrical properties of cobalt-copper multilayers was investigated. Hydrogen implantation increases the bi-layer thickness, the separation of crystal planes, the remanence and saturation resistivity, but reduces the magnetoresistance ratio, coercive force, saturation magnetic field and saturation magnetic moment of the multilayers. The magnetoresistance of the multilayers is relatively unaffected by hydrogen implantation.
